Self-Service Historical Time Series Analytics for Semiconductor Manufacturing

Grayson TimeSeries analyzes one prepared CSV or Excel file of fab equipment and facilities history. Typical uploads include etch vacuum-cycle summaries with tool and chamber IDs, pump-down duration, base and crossover pressure, wafers since maintenance, and maintenance markers; wafer- or step-level controller-reported ESC temperatures with recipe and helium context; and UPW loop records with raw and temperature-compensated resistivity, supply temperature, return pressure, and operating state.

Summarize or select the cycle, wafer, step, or event window outside Grayson, then combine signals into one flat file. Include feature definitions, units, state labels, recipe context, and maintenance markers so chamber and period comparisons stay aligned. Direct historian access usually starts as a CSV or XLSX export; a managed AVEVA or historian connection needs IT.

Yes. With one prepared row per cycle, Grayson can compare pump-down duration, base pressure, crossover pressure, and recovery pattern across chambers and before versus after a maintenance marker. Equipment engineers can use that comparison to prioritize trace review, instrumentation checks, chamber inspection, valve and seal review, and maintenance reconciliation. A cycle-level shift alone does not establish a leak or pump failure.

Yes. Grayson can compare prepared wafer- or step-level controller-reported inner and outer temperatures and zone delta across chambers for the same recipe step, with helium back pressure, RF power, and maintenance context. That surfaces chambers and time windows for qualified tool review. Controller values may be setpoints, estimates, or conditioned signals rather than direct wafer measurements, so process and yield impact still need tool and metrology evidence.

Upload a prepared utility file with timestamp, loop ID, raw and documented temperature-compensated resistivity, supply temperature, return pressure, operating state, and excursion flags. Grayson can compare raw versus compensated resistivity, surface excursions that persist after temperature compensation, and group them with operating context so facilities teams get a focused event list for instrumentation and treatment-system review.

Wafer temperature, process impact, defect causation, water-quality certification, SEMI F63 applicability, sampling and calibration status, and any compliance or yield decision remain with the facility’s qualified review. Grayson surfaces recorded patterns and differences in prepared historical files; it does not replace tool, metrology, process, yield, or approved UPW procedures.